Product Details

Product Details
Product Details

HORIZONTAL HEAT TREATMENT FURNACE/
DF1000

Horizontal diffusion furnaces are systems for performing heat treatment that is part of semiconductor manufacturing processes. Their structure consists of a heater chamber mounted horizontally, with 2 to 4 tiers stacked vertically for effective utilization of space. The types of heat treatment that can be conducted include diffusion and oxidation, with treatment temperatures ranging from low to high. A wide range of processes can be supported with the use of our company's high-performance controllers.
Features

■Improvement of soaking characteristics
Stable temperature control and soaking lengths can be made possible by combining heaters suited to the working temperature with our own high-performance controllers.

■Compatible with 100 to 200 mm wafers
The diffusion furnace system can accommodate customer requirements from φ100 mm to φ200 mm.

■Easy maintainability
The structure allows thermocouples or heaters to be replaced safely even while other heaters are increasing in temperature.

■Cost performance
Low cost has been achieved by carefully selecting the parts used and developing waste-free structures.

■Suitable for refurbishment
The external dimensions have been minimized to be suitable for the refurbishment of older systems with limited space.

Specifications
Wafer sizeUp to φ200 mmUp to φ150 mmUp to φ125 mm Up to φ100 mm
Furnace unit dimensionsW 2650mm×
D 1200mm×
H 2580mm
W 2300mm×
D 850mm×
H 2395mm
W 2180mm×
D 850mm×
H 2395mm
W 1850mm×
D 700mm×
H 2150mm
Soak length900mm±1.0℃
(No.GAS)
900mm±1.0℃
(No.GAS)
800mm±1.0℃
(No.GAS)
800mm±1.0℃
(No.GAS)
Temperature range600~1200℃600~1200℃600~1200℃600~1200℃
Temperature control3-zone independent control3-zone independent control3-zone independent control3-zone independent control
Transport systems (option)Soft loader
Boat elevator soft loader
Soft loader
Boat elevator
Boat loader
Soft loader
Boat elevator
Boat loader
Boat loader