■Cost performance
Can be provided at low cost by customizing systems to accommodate customers when being installed, and reducing startup times.
■Space-fitting performance
The external configuration is suitable for existing clean rooms.
Main unit dimensions: H2600 x W900 x D1280
■Maintenance performance
Major components and software are developed by our company, allowing maintenance to be continued well into the future.
■Customization performance
Various types of customization to respond to customer needs are possible.
■Product performance
Small footprint allowing installation in place of horizontal furnaces.
■Energy performance
Energy savings of 10% compared to our company's past products have been achieved by the development of high-efficiency heaters.
Optional support can also accommodate high-speed temperature increases and decreases, or high-temperature processes.
| ●Basic specifications | |
|---|---|
| Structure: | Vertical downward-opening system |
| Process wafer diameter: | 4, 5, 6, 8 inch |
| Treatment quantity: | Process wafers: 150 wafers (6-inch or less) or 100 wafers (8-inch) |
| Cassette storage: | Up to 8 cassettes including process and dummy cassettes (6-inch or less) |
| Up to 6 cassettes including process and dummy cassettes (8-inch or less) | |
| Processes: | WET, DRY, ANNEAL, etc. |
| Usable gases: | N2, O2, H2, etc. |
| Wafer handling: | 3 wafers fixed (standard), 5 wafer batch/1 wafer (option) |
| Temperature increase and decrease rates: | Temperature increase: max. of 10℃/min Temperature decrease: max. of 3℃/min |
Phone Inquiries
Product Pricing and Delivery Inquiries:
Hours: 9:30～17:00
